Systems and methods for gamma radiation-based stabilization of replicated mirror structures at the nanometer-scale

Issue
 Date
Publication Date
Patent No.
11,125,669
Category
Method or Process (e.g. a way to accomplish a given result)
A system includes a curing assembly for low temperature curing and residual stress relief of material substrates. The curing assembly includes a first exposure chamber configured to expose the material substrate to UV radiation, and a second exposure chamber configured to expose the material substrate to Gamma radiation. In some embodiments, a mixing apparatus may mix nano-filler particles into the material substrate prior to exposure to Gamma radiation. The cure assembly may also include a control system for determining exposure dosages and exposure times based at least in part, on the material properties of the material substrate.
Keywords: composite, mirror
International Class: G01N 11/00 (20060101), G01N 21/63 (20060101), B29C 35/02 (20060101), G01N 21/64 (20060101)