Method for Producing Low-Friction Carbon Films at Room Temperature

Issue
 Date
Publication Date
Patent No.
7,241,475
Category
Method or Process

Reactive halogen-ion plasmas, having for example, generating chloride ions, generated from low-pressure halogen gases using a radio-frequency plasma are employed for producing low-friction carbon coatings, such as a pure carbon film, at or near room temperature on a bulk or thin film of a compound, such as titanium carbide.

Keywords: films, carbon films, plasma deposition
International Class: C23C16/02, C23C16/32, H05H1/24